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011106s1998 njua obf 001 0 eng d |
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|z 97044664
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|a KNOVL
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|a 49270322
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|a 1591240794
|q (electronic bk.)
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|a 9781591240792
|q (electronic bk.)
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|a 9780815514220
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|a 0815514220
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|a (WaSeSS)ssj0000072232
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|a (OCoLC)49708622
|z (OCoLC)49270322
|z (OCoLC)281593731
|z (OCoLC)639757318
|z (OCoLC)961887604
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|z (OCoLC)1340058153
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050 |
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|a TS695
|b .M38 1998eb
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082 |
0 |
4 |
|a 671.7/35021
|2 22
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100 |
1 |
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|a Mattox, D. M.
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245 |
1 |
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|a Handbook of physical vapor deposition (PVD) processing :
|b film formation, adhesion, surface preparation and contamination control /
|c by Donald M. Mattox.
|
260 |
|
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|a Westwood, N.J. :
|b Noyes Publications,
|c �1998.
|
300 |
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|a 1 online resource (xxvii, 917 pages) :
|b illustrations
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336 |
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|a text
|b txt
|2 rdacontent
|
337 |
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|a computer
|b c
|2 rdamedia
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338 |
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|a online resource
|b cr
|2 rdacarrier
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520 |
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|a Covers aspects of the Physical Vapor Deposition process technology from characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. Includes subjects such as substrate characterization, adhesion, cleaning, and processing. Also covers the more widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes.
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504 |
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|a Includes bibliographical references and index.
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588 |
0 |
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|a Print version record.
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|a Introduction -- Substrate (""Real"") Surfaces and Surface Modification -- The Low-Pressure Gas and Vacuum Processing Environment -- The Low-Pressure Plasma Processing Environment -- Vacuum Evaporation and Vacuum Deposition -- Physical Sputtering and Sputter Deposition (Sputtering) -- Arc Vapor Deposition -- Ion Plating and Ion Beam Assisted Deposition -- Atomistic Film Growth and Some Growth-Related Film Properties -- Film Characterization and Some Basic Film Properties -- Addhesion and Deadhesion -- Cleaning -- External Processing Environment -- APPENDIX 1: Reference Material -- APPENDIX 2: Transfer of Technology from R & D to Manufacturing -- Glossary of Terms and Acronyms Used in Surface Engineering.
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546 |
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|a English.
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650 |
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|a Vapor-plating
|v Handbooks, manuals, etc.
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650 |
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7 |
|a Vapor-plating
|2 fast
|0 (OCoLC)fst01164135
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650 |
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|a Galvanoplastia.
|2 larpcal
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|a Manuais.
|2 larpcal
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655 |
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2 |
|a Handbook
|0 (DNLM)D020479
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655 |
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7 |
|a handbooks.
|2 aat
|0 (CStmoGRI)aatgf300311807
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655 |
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7 |
|a Handbooks and manuals
|2 fast
|0 (OCoLC)fst01423877
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655 |
|
7 |
|a Handbooks and manuals.
|2 lcgft
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655 |
|
7 |
|a Guides et manuels.
|2 rvmgf
|0 (CaQQLa)RVMGF-000001065
|
776 |
0 |
8 |
|i Print version:
|a Mattox, D.M.
|t Handbook of physical vapor deposition (PVD) processing.
|d Westwood, N.J. : Noyes Publications, �1998
|z 0815514220
|w (DLC) 97044664
|w (OCoLC)37806270
|
856 |
4 |
0 |
|u https://sciencedirect.uam.elogim.com/science/book/9780815514220
|z Texto completo
|