Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control /

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Covers aspects of the Physical Vapor Deposition process technology from characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. Includes subjects such as substrate characterization, adhesion, cleaning, and processin...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Mattox, D. M.
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Westwood, N.J. : Noyes Publications, �1998.
Temas:
Vapor-plating > Handbooks, manuals, etc.
Vapor-plating
Galvanoplastia.
Manuais.
Handbook
handbooks.
Handbooks and manuals
Handbooks and manuals.
Guides et manuels.
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Introduction
  • Substrate (""Real"") Surfaces and Surface Modification
  • The Low-Pressure Gas and Vacuum Processing Environment
  • The Low-Pressure Plasma Processing Environment
  • Vacuum Evaporation and Vacuum Deposition
  • Physical Sputtering and Sputter Deposition (Sputtering)
  • Arc Vapor Deposition
  • Ion Plating and Ion Beam Assisted Deposition
  • Atomistic Film Growth and Some Growth-Related Film Properties
  • Film Characterization and Some Basic Film Properties
  • Addhesion and Deadhesion
  • Cleaning
  • External Processing Environment
  • APPENDIX 1: Reference Material
  • APPENDIX 2: Transfer of Technology from R & D to Manufacturing
  • Glossary of Terms and Acronyms Used in Surface Engineering.

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