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Handbook of chemical vapor deposition : principles, technology, and applications /
CVD technology has grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Norwich, N.Y. :
Noyes Publications,
1999.
|
| Edición: | 2nd ed. |
| Colección: | Materials science and process technology series. Electronic materials and process technology.
|
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
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| 037 | |a 153777:153937 |b Elsevier Science & Technology |n http://www.sciencedirect.com | ||
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| 082 | 0 | 4 | |a 671.7/35021 |2 22 |
| 049 | |a UAMI | ||
| 100 | 1 | |a Pierson, Hugh O. | |
| 245 | 1 | 0 | |a Handbook of chemical vapor deposition : |b principles, technology, and applications / |c by Hugh O. Pierson. |
| 250 | |a 2nd ed. | ||
| 260 | |a Norwich, N.Y. : |b Noyes Publications, |c 1999. | ||
| 300 | |a 1 online resource (xxiv, 482 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
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| 490 | 1 | |a Materials science and process technology series. Electronic materials and process technology | |
| 520 | |a CVD technology has grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Readers will find data on both Plasma CVD and metallo-organic CVD processes. The book also explains the growing importance of CVD in production of semiconductor and related applications. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 588 | 0 | |a Print version record. | |
| 506 | |a Access restricted to Ryerson students, faculty and staff. |5 CaOTR | ||
| 505 | 0 | |a Introduction and General Considerations -- Fundamentals of Chemical Vapor Deposition -- The Chemistry of CVD -- Metallo-Organic CVD (MOCVD) -- CVD Processes and Equipment -- The CVD of Metals -- The CVD of the Allotropes of Carbon -- The CVD of Non-Metallic Elements -- The CVD of Ceramic Materials: Carbides -- The CVD of Ceramic Materials: Nitrides -- The CVD of Ceramic Materials: Oxides -- The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides) -- CVD in Electronic Applications: Semiconductors -- CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers -- CVD in Optoelectronic and Ferroelectric Applications -- CVD in Optical Applications -- CVD in Wear- and Corrosion-Resistant Applications -- CVD in Cutting-Tool Applications -- CVD in Fiber, Powder, and Monolithic Applications -- Conversion Guide -- Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification -- Index. | |
| 590 | |a Knovel |b ACADEMIC - Electronics & Semiconductors | ||
| 590 | |a Knovel |b ACADEMIC - Metals & Metallurgy | ||
| 650 | 0 | |a Vapor-plating |v Handbooks, manuals, etc. | |
| 650 | 0 | |a Chemical vapor deposition |v Handbooks, manuals, etc. | |
| 650 | 6 | |a Dépôt chimique en phase vapeur |v Guides, manuels, etc. | |
| 650 | 7 | |a Chemical vapor deposition |2 fast | |
| 650 | 7 | |a Vapor-plating |2 fast | |
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| 655 | 7 | |a Handbooks and manuals |2 fast | |
| 655 | 7 | |a Handbooks and manuals. |2 lcgft | |
| 655 | 7 | |a Guides et manuels. |2 rvmgf | |
| 776 | 0 | 8 | |i Print version: |a Pierson, Hugh O. |t Handbook of chemical vapor deposition. |b 2nd ed. |d Norwich, N.Y. : Noyes Publications, 1999 |z 0815514328 |w (DLC) 99026065 |w (OCoLC)41090758 |
| 830 | 0 | |a Materials science and process technology series. |p Electronic materials and process technology. | |
| 856 | 4 | 0 | |u https://appknovel.uam.elogim.com/kn/resources/kpHCVDCVD4/toc |z Texto completo |
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