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Handbook of chemical vapor deposition : principles, technology, and applications /
CVD technology has grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is...
| Clasificación: | Libro Electrónico |
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| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Norwich, N.Y. :
Noyes Publications,
1999.
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| Edición: | 2nd ed. |
| Colección: | Materials science and process technology series. Electronic materials and process technology.
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| Temas: | |
| Acceso en línea: | Texto completo |
| Sumario: | CVD technology has grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Readers will find data on both Plasma CVD and metallo-organic CVD processes. The book also explains the growing importance of CVD in production of semiconductor and related applications. |
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| Descripción Física: | 1 online resource (xxiv, 482 pages) : illustrations |
| Bibliografía: | Includes bibliographical references and index. |
| ISBN: | 1591240301 9781591240303 9780815517436 0815517432 |
| Acceso: | Access restricted to Ryerson students, faculty and staff. |