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New approaches to image processing based failure analysis of nano-scale ULSI devices /

New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Zalevsky, Zeev
Otros Autores: Livshits, Pavel, Gur, Eran
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Oxford : William Andrew, 2014.
Colección:Micro & nano technologies.
Temas:
Acceso en línea:Texto completo

MARC

LEADER 00000cam a2200000 a 4500
001 SCIDIR_ocn864414537
003 OCoLC
005 20231117044931.0
006 m o d
007 cr cnu---unuuu
008 131130s2014 enk ob 000 0 eng d
040 |a EBLCP  |b eng  |e pn  |c EBLCP  |d OCLCO  |d OPELS  |d N$T  |d YDXCP  |d OCLCQ  |d UPM  |d B24X7  |d COO  |d OCLCF  |d OCLCQ  |d DEBSZ  |d OCLCQ  |d MERUC  |d OCLCQ  |d K6U  |d U3W  |d D6H  |d OCLCQ  |d S9I  |d OCLCQ  |d VLY  |d EYM  |d OCLCO  |d OCLCQ  |d OCLCO 
019 |a 1058190673  |a 1162263238  |a 1300610463 
020 |a 9780323241434  |q (electronic bk.) 
020 |a 0323241433  |q (electronic bk.) 
020 |a 9780128000175  |q (electronic bk.) 
020 |a 0128000171  |q (electronic bk.) 
035 |a (OCoLC)864414537  |z (OCoLC)1058190673  |z (OCoLC)1162263238  |z (OCoLC)1300610463 
050 4 |a QA76.9.A73  |b .Z384 2013 
072 7 |a TEC  |x 009070  |2 bisacsh 
082 0 4 |a 621.381 
100 1 |a Zalevsky, Zeev. 
245 1 0 |a New approaches to image processing based failure analysis of nano-scale ULSI devices /  |c Zeev Zalevsky, Pavel Livshits, Eran Gur. 
260 |a Oxford :  |b William Andrew,  |c 2014. 
300 |a 1 online resource (179 pages) 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a Micro and Nano Technologies 
520 |a New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can't keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise. 
588 0 |a Print version record. 
504 |a Includes bibliographical references. 
505 0 |a Front Cover; New Approaches to Image Processing based Failure Analysis of Nano-Scale ULSI Devices; Copyright Page; Contents; Preface; 1 Introduction; 1.1 Basics of Image Processing; 1.1.1 Introduction to Image Processing; 1.1.2 Histograms; 1.1.3 Spatial Filtering; 1.1.4 Fourier Analysis; 1.2 The Problems of Shrinking Feature Size in ULSI Development and Failure Analysis; 1.3 High Resolution Imaging of Structures; 1.4 Fabrication Techniques in ULSI Industry; References; 2 New Image Processing Methods for Advanced Metallization in Micro- and Nano-Electronics 
505 8 |a 2.1 Characteristics of Metal Ultrathin Films' Microstructures2.2 Increased Productivity by Obviating Steps of Selection of Measurement Conditions; 2.2.1 Introduction; 2.2.2 The Novel Algorithm; 2.3 Demonstration of Method Capabilities; References; 3 New Super Resolving Techniques and Methods for Microelectronics; 3.1 The basics of super resolution; 3.1.1 Introduction; 3.1.2 Fundamental limits to resolution improvement; 3.1.3 Diffractive optical superresolution; 3.1.4 Geometrical superresolution; 3.1.4.1 Sampling density; 3.1.4.2 Nonideal sampling; 3.1.4.3 Image sequence approaches 
505 8 |a 3.1.4.4 Approach involving physical components3.1.4.5 Digital processing methods; 3.1.5 Wigner Transform; 3.1.5.1 Wigner of sampled signals; 3.1.5.2 Wigner of microscanned signals; 3.1.5.3 Nonideal sampling; 3.1.5.4 Geometrical super resolution; 3.2 Super-Resolution Imaging for Improved Failure Analysis; 3.2.1 Resolution limit in failure analysis; 3.2.2 Super Resolving Algorithm; 3.2.3 Experimental Results; 3.3 Usage of Radon Transform for Improved Failure Analysis; 3.3.1 The Radon Transform theory; 3.3.2 Failure analysis based upon Radon transform; 3.3.3 The Algorithm 
546 |a English. 
650 0 |a Integrated circuits  |x Ultra large scale integration  |x Testing. 
650 0 |a Nanoelectronics. 
650 0 |a Microelectronics. 
650 2 |a Miniaturization  |0 (DNLM)D008904 
650 6 |a Nano�electronique.  |0 (CaQQLa)201-0225434 
650 6 |a Micro�electronique.  |0 (CaQQLa)201-0035977 
650 7 |a microelectronics.  |2 aat  |0 (CStmoGRI)aat300253974 
650 7 |a TECHNOLOGY & ENGINEERING  |x Mechanical.  |2 bisacsh 
650 7 |a Integrated circuits  |x Ultra large scale integration  |x Testing  |2 fast  |0 (OCoLC)fst00975599 
650 7 |a Microelectronics  |2 fast  |0 (OCoLC)fst01019757 
650 7 |a Nanoelectronics  |2 fast  |0 (OCoLC)fst01741867 
700 1 |a Livshits, Pavel. 
700 1 |a Gur, Eran. 
776 0 8 |i Print version:  |a Zalevsky, Zeev.  |t New Approaches to Image Processing based Failure Analysis of Nano-Scale ULSI Devices.  |d Burlington : Elsevier Science, �2013  |z 9780323241434 
830 0 |a Micro & nano technologies. 
856 4 0 |u https://sciencedirect.uam.elogim.com/science/book/9780323241434  |z Texto completo