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High density plasma sources : design, physics, and performance /
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielec...
| Call Number: | Libro Electrónico |
|---|---|
| Other Authors: | |
| Format: | Electronic eBook |
| Language: | Inglés |
| Published: |
Park Ridge, N.J. :
Noyes Publications,
�1995.
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| Series: | Materials science and process technology series. Electronic materials and process technology.
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| Subjects: | |
| Online Access: | Texto completo |