Silicon technologies : ion implantation and thermal treatment /

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The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Baudrant, Annie
Formato: Electrónico eBook
Idioma:Inglés
Publicado: London : Hoboken, NJ : ISTE ; Wiley, 2011.
Temas:
Semiconductor doping.
Ion implantation.
Semiconductors > Heat treatment.
Semi-conducteurs > Dopage.
Ions > Implantation.
Semi-conducteurs > Traitement thermique.
TECHNOLOGY & ENGINEERING > Electronics > Semiconductors.
TECHNOLOGY & ENGINEERING > Electronics > Solid State.
Ion implantation
Semiconductor doping
Semiconductors > Heat treatment
Acceso en línea:Texto completo (Requiere registro previo con correo institucional)
Descripción
Sumario:The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Notas:Title from PDF title page (viewed on Feb. 28, 2013).
Descripción Física:1 online resource : illustrations
Bibliografía:Includes bibliographical references and index.
ISBN:9781118601044
1118601041
9781118601112
1118601114
9781118601143
1118601149

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