Silicon technologies : ion implantation and thermal treatment /

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The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

Détails bibliographiques
Cote:Libro Electrónico
Autres auteurs: Baudrant, Annie
Format: Électronique eBook
Langue:Inglés
Publié: London : Hoboken, NJ : ISTE ; Wiley, 2011.
Sujets:
Semiconductor doping.
Ion implantation.
Semiconductors > Heat treatment.
Semi-conducteurs > Dopage.
Ions > Implantation.
Semi-conducteurs > Traitement thermique.
TECHNOLOGY & ENGINEERING > Electronics > Semiconductors.
TECHNOLOGY & ENGINEERING > Electronics > Solid State.
Ion implantation
Semiconductor doping
Semiconductors > Heat treatment
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