Extreme ultraviolet lithography /

"Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL expe...

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Bibliographic Details
Call Number:Libro Electrónico
Other Authors: Wu, Banqiu, Kumar, Ajay, 1962-, Eynon, Benjamin G., Naulleau, Patrick, Richardson, Martin, La Fontaine, Bruno, Yulin, Sergiy, Silver, Richard M., Vladar, Andras E., Kamberian, Henry
Format: Electronic eBook
Language:Inglés
Published: New York, N.Y. : McGraw-Hill Education, [2009]
Edition:First edition.
Series:McGraw-Hill's AccessEngineering.
Subjects:
Extreme ultraviolet lithography.
Integrated circuits > Masks.
Integrated circuits > Design and construction.
Electronic books.
Online Access:Texto completo
Table of Contents:
  • Exposure system
  • EUV sources
  • EUV optics
  • Multilayer interference coatings for EUVL
  • EUV photoresist
  • EUVL masks.

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