Handbook of physical vapor deposition (PVD) processing /

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This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the ne...

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Détails bibliographiques
Cote:Libro Electrónico
Auteur principal: Mattox, D. M.
Format: Électronique eBook
Langue:Inglés
Publié: Norwich, N.Y. : Oxford : William Andrew ; Elsevier Science [distributor], ©2010.
Édition:2nd ed.
Sujets:
Physical vapor deposition > Handbooks, manuals, etc.
Dépôt physique en phase vapeur > Guides, manuels, etc.
Physical vapor deposition
handbooks.
manuals (instructional materials)
Handbooks and manuals
Handbooks and manuals.
Guides et manuels.
Accès en ligne:Texto completo
Table des matières:
  • Substrate ("Real") Surfaces and Surface Modification
  • The "Good" Vacuum (Low Pressure) Processing Environment
  • The Sub-Atmospheric Processing Environments
  • The Low-Pressure Plasma Processing Environment
  • Vacuum Evaporation and Vacuum Deposition
  • Physical Sputtering and Sputter Deposition (Sputtering)
  • Arc Vapor Deposition
  • Ion Plating and Ion Beam Assisted Deposition
  • Atomistic Film Growth and Some Growth-Related Film Properties
  • Film Characterization and Some Basic Film Properties
  • Adhesion and Deadhesion
  • Cleaning
  • External Processing Environment
  • Transfer of Technology from R & D to Manufacturing.

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