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Efficient extreme ultraviolet mirror design : an FDTD approach /
Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and...
| Clasificación: | Libro Electrónico |
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| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Bristol [England] (Temple Circus, Temple Way, Bristol BS1 6HG, UK) :
IOP Publishing,
[2021]
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| Colección: | IOP (Series). Release 21.
IOP series in advances in optics, photonics and optoelectronics. IOP ebooks. 2021 collection. |
| Temas: | |
| Acceso en línea: | Texto completo |