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Directed self-assembly of block copolymers for nano-manufacturing /

The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufactur...

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Détails bibliographiques
Cote:Libro Electrónico
Autres auteurs: Gronheid, Roel (Éditeur intellectuel), Nealey, Paul (Éditeur intellectuel)
Format: Électronique eBook
Langue:Inglés
Publié: Cambridge : Woodhead Publishing, [2015]
Collection:Woodhead Publishing series in electronic and optical materials ; no. 83.
Sujets:
Accès en ligne:Texto completo