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Directed self-assembly of block copolymers for nano-manufacturing /

The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufactur...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Gronheid, Roel (Editor ), Nealey, Paul (Editor )
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Cambridge : Woodhead Publishing, [2015]
Colección:Woodhead Publishing series in electronic and optical materials ; no. 83.
Temas:
Acceso en línea:Texto completo