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Applied solid state science. advances in materials and device research / Supplement 2, Silicon integrated circuits. Part C :

Silicon Integrated Circuits, Part 2 covers some of the most promising approaches along with the new understanding of processing-related areas of physics and chemistry. The first chapter is about the transient thermal processing of silicon, including annealing with directed-energy beams and rapid iso...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Wolfe, Raymond (Editor ), Kahng, Dawon (Editor )
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Orlando ; London : Academic, 1985.
Colección:Applied solid state science. Supplement ; 2.
Temas:
Acceso en línea:Texto completo
Descripción
Sumario:Silicon Integrated Circuits, Part 2 covers some of the most promising approaches along with the new understanding of processing-related areas of physics and chemistry. The first chapter is about the transient thermal processing of silicon, including annealing with directed-energy beams and rapid isothermal annealing; adiabatic annealing with laser and electron beams; pulsed melting; thermal flux annealing; rapid isothermal annealing; and several applications stemming from rapid annealing and semiconductor processing with directed-energy beams. The second chapter is concerned with the use of el.
Notas:Includes index.
Descripción Física:1 online resource (x, 359 pages) : illustrations
Bibliografía:Includes bibliographical references at the end of each chapters and indexes.
ISBN:9781483214788
1483214788
ISSN:0194-2891 ;