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Thin films by chemical vapour deposition /
The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several uniqu...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés Romanian |
| Publicado: |
Amsterdam ; New York : Bucharest, Romania :
Elsevier ; Editura Tehnic�a,
1990.
|
| Colección: | Thin films science and technology ;
7. |
| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- Front Cover; Thin Films by Chemical Vapour Deposition; Preface; Acknowledgements; Table of Contents; Part I: INTRODUCTION; CHAPTER 1. EVOLUTION OF CVD FILMS; 1.1 Introductory Remarks; 1.2 Short History of CVD Thin Films; Part II: FUNDAMENTALS; CHAPTER 2. TECHNIQUES OF PREPARING THIN FILMS; 2.1 Introduction; 2.2 Electrolytic Deposition Techniques; 2.3 Vacuum Deposition Techniques; 2.4 Plasma Deposition Techniques; 2.5 Liquid-Phase Deposition Techniques; 2.6 Solid-Phase Deposition Techniques; 2.7 Chemical Vapour Conversion of Substrate; 2.8 Chemical Vapour Deposition.
- 2.9 Comparison between CVD and Other Thin Film Deposition TechniquesCHAPTER 3. CHEMICAL PROCESSES USED IN CVD; 3.1 Introduction; 3.2 Description of Chemical Reactions Used in CVD; CHAPTER 4. THERMODYNAMICS OF CVD; 4.1 General Remarks; 4.2 Feasibility of a CVD Process; 4.3 Techniques for Equilibrium Calculations in CVD Systems; 4.4 Examples of Thermodynamic Studies of CVD Systems; CHAPTER 5. KINETICS OF CVD; 5.1 Introduction; 5.2 Steps and Control Type of a CVD Heterogeneous Reaction; 5.3 Influence of Experimental Parameters on Thin Film Deposition Rate.
- 5.4 Continuous Measurement of the Deposition Rate5.5 Experimental Methods for Studying CVD Kinetics; 5.6 Role of Homogeneous Reactions in CVD; 5.7 Mechanism of CVD Processes; 5.8 Kinetics and Mechanism of Dopant Incorporation; 5.9 Transport Phenomena in CVD; 5.10 Status of Kinetic and Mechanism Investigations in CVD Systems; CHAPTER 6. MEASUREMENT OF THIN FILM THICKNESS; 6.1 Introduction; 6.2 Mechanical Methods; 6.3 Mechanical-Optical Methods; 6.4 Optical Methods; 6.5 Electrical Methods; 6.6 Miscellaneous Methods; CHAPTER 7. NUCLEATION AND GROWTH OF CVD FILMS; 7.1 Introduction.
- 7.2 Stages in the Nucleation and Growth Mechanism7.3 Regimes of Nucleation and Growth; 7.4 Nucleation Theory; 7.5 Dependence of Nucleation on Deposition Parameters; 7.6 Heterogeneous Nucleation and CVD Film Structural Forms; 7.7 Homogeneous Nucleation; 7.8 Experimental Techniques; 7.9 Experimental Results of CVD Film Nucleation; CHAPTER 8. THIN FILM STRUCTURE; 8.1 Introduction; 8.2 Techniques for Studying Thin Film Structure; 8.3 Structural Defects in CVD Thin Films; CHAPTER 9. ANALYSIS OF CVD FILMS; 9.1 Introduction; 9.2 Analysis Techniques of Thin Film Bulk.
- 9.3 Analysis Techniques of Thin Film Surfaces9.4. Film Composition Measurement; 9.5 Depth Concentration Profiling; CHAPTER 10. PROPERTIES OF CVD FILMS; 10.1 Introduction; 10.2 Mechanical Properties; 10.3. Thermal Properties; 10.4 Optical Properties; 10.5. Photoelectric Properties; 10.6 Electrical Properties; 10.7 Magnetic Properties; 10.8 Chemical Properties; Part III: TECHNIQUES; CHAPTER 11. EQUIPMENT AND SUBSTRATES; 11.1 Introduction; 11.2 Equipment for CVD; 11.3 Safety in CVD; 11.4 Substrates; CHAPTER 12 PREPARATION AND PROPERTIES OF SEMICONDUCTING THIN FILMS; 12.1 Introduction.