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Thin films by chemical vapour deposition /
The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several uniqu...
| Clasificación: | Libro Electrónico |
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| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés Romanian |
| Publicado: |
Amsterdam ; New York : Bucharest, Romania :
Elsevier ; Editura Tehnic�a,
1990.
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| Colección: | Thin films science and technology ;
7. |
| Temas: | |
| Acceso en línea: | Texto completo |
| Sumario: | The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overvie. |
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| Notas: | Rev., updated, and enl. translation of: Depunerea chimic�a din vaporie a straturilor sub�tiri. |
| Descripción Física: | 1 online resource (717 pages) : illustrations |
| Bibliografía: | Includes bibliographical references (pages 525-681) and indexes. |
| ISBN: | 9781483291734 1483291731 |