Cargando…
Rapid thermal processing : science and technology /
This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from...
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Boston :
Academic Press,
�1993.
|
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
| LEADER | 00000cam a2200000 a 4500 | ||
|---|---|---|---|
| 001 | SCIDIR_ocn622820046 | ||
| 003 | OCoLC | ||
| 005 | 20231117033131.0 | ||
| 006 | m o d | ||
| 007 | cr bn||||||abp | ||
| 007 | cr bn||||||ada | ||
| 008 | 100519s1993 maua ob 001 0 eng d | ||
| 040 | |a OCLCE |b eng |e pn |c OCLCE |d OCLCQ |d OPELS |d E7B |d OCLCO |d IDEBK |d OCLCQ |d OCLCF |d UIU |d OCLCQ |d LEAUB |d OCLCQ |d OCLCO |d OCLCQ |d OCLCO | ||
| 019 | |a 300518335 | ||
| 020 | |z 0122476905 | ||
| 020 | |z 9780122476907 |q (acid-free paper) | ||
| 035 | |a (OCoLC)622820046 |z (OCoLC)300518335 | ||
| 042 | |a dlr | ||
| 050 | 4 | |a TK7871.85 |b .F299 1993 | |
| 082 | 0 | 4 | |a 621.3815/2 |2 20 |
| 245 | 0 | 0 | |a Rapid thermal processing : |b science and technology / |c edited by Richard B. Fair. |
| 260 | |a Boston : |b Academic Press, |c �1993. | ||
| 300 | |a 1 online resource (viii, 430 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 504 | |a Includes bibliographical references and index. | ||
| 505 | 2 | |a 1. Rapid Thermal Processing -- A Justification / Richard B. Fair -- 2. Rapid Thermal Processing-Based Epitaxy / J.L. Hoyt -- 3. Rapid Thermal Growth and Processing of Dielectrics / Hisham Z. Massoud -- 4. Thin-Film Deposition / Mehmet C. Ozturk -- 5. Extended Defects from Ion Implantation and Annealing / Kevin S. Jones and George A. Rozgonyi -- 6. Junction Formation in Silicon by Rapid Thermal Annealing / Richard B. Fair -- 7. Silicides / C.M. Osburn -- 8. Issues in Manufacturing Unique Silicon Devices Using Rapid Thermal Annealing / B. Lojek -- 9. Manufacturing Equipment Issues in Rapid Thermal Processing / Fred Roozeboom. | |
| 506 | |3 Use copy |f Restrictions unspecified |2 star |5 MiAaHDL | ||
| 533 | |a Electronic reproduction. |b [Place of publication not identified] : |c HathiTrust Digital Library, |d 2010. |5 MiAaHDL | ||
| 538 | |a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. |u http://purl.oclc.org/DLF/benchrepro0212 |5 MiAaHDL | ||
| 583 | 1 | |a digitized |c 2010 |h HathiTrust Digital Library |l committed to preserve |2 pda |5 MiAaHDL | |
| 520 | |a This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering. | ||
| 588 | 0 | |a Print version record. | |
| 650 | 0 | |a Semiconductors |x Heat treatment. | |
| 650 | 0 | |a Semiconductor doping. | |
| 650 | 0 | |a Rapid thermal processing. | |
| 650 | 6 | |a Semi-conducteurs |x Traitement thermique. |0 (CaQQLa)201-0306107 | |
| 650 | 6 | |a Semi-conducteurs |x Dopage. |0 (CaQQLa)201-0318260 | |
| 650 | 6 | |a Recuit thermique rapide. |0 (CaQQLa)201-0306134 | |
| 650 | 7 | |a Rapid thermal processing |2 fast |0 (OCoLC)fst01090061 | |
| 650 | 7 | |a Semiconductor doping |2 fast |0 (OCoLC)fst01112124 | |
| 650 | 7 | |a Semiconductors |x Heat treatment |2 fast |0 (OCoLC)fst01112224 | |
| 650 | 7 | |a Tecnologia de dispositivos semicondutores. |2 larpcal | |
| 653 | 0 | |a Semiconductors | |
| 700 | 1 | |a Fair, Richard B. | |
| 776 | 0 | 8 | |i Print version: |t Rapid thermal processing. |d Boston : Academic Press, �1993 |w (DLC) 93006882 |w (OCoLC)27432101 |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9780122476907 |z Texto completo |