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Dry etching for microelectronics /
This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides...
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Amsterdam ; New York : New York, N.Y. :
North-Holland Physics Pub. ; Distributors for the USA and Canada, Elsevier Science Pub. Co.,
1984.
|
| Colección: | Materials processing, theory and practices ;
v. 4. |
| Temas: | |
| Acceso en línea: | Texto completo Texto completo |
MARC
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| 020 | |a 0444869050 |q (electronic bk.) | ||
| 020 | |a 9780444869050 |q (electronic bk.) | ||
| 035 | |a (OCoLC)610274813 | ||
| 042 | |a dlr | ||
| 050 | 4 | |a TK7871.85 |b .D79 1984 | |
| 082 | 0 | 4 | |a 621.381/73 |
| 245 | 0 | 0 | |a Dry etching for microelectronics / |c edited by Ronald A. Powell. |
| 260 | |a Amsterdam ; |a New York : |b North-Holland Physics Pub. ; |a New York, N.Y. : |b Distributors for the USA and Canada, Elsevier Science Pub. Co., |c 1984. | ||
| 300 | |a 1 online resource (xi, 299 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Materials processing--theory and practices ; |v v. 4 | |
| 504 | |a Includes bibliographical references (pages 223-294) and index. | ||
| 506 | |3 Use copy |f Restrictions unspecified |2 star |5 MiAaHDL | ||
| 533 | |a Electronic reproduction. |b [Place of publication not identified] : |c HathiTrust Digital Library, |d 2010. |5 MiAaHDL | ||
| 538 | |a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. |u http://purl.oclc.org/DLF/benchrepro0212 |5 MiAaHDL | ||
| 583 | 1 | |a digitized |c 2010 |h HathiTrust Digital Library |l committed to preserve |2 pda |5 MiAaHDL | |
| 520 | |a This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides the reader with more specialised information and references than found in a general review article. In addition, it presents a broad perspective which would otherwise have to be gained by reading a large number of individual research papers. An additional important and unique feature of this book is the inclusion of an extensive literature review of dry processing, compiled by search of computerized data bases. A subject index allows ready access to the key points raised in each of the chapters. | ||
| 588 | 0 | |a Print version record. | |
| 650 | 0 | |a Semiconductors |x Etching. | |
| 650 | 0 | |a Plasma etching. | |
| 650 | 6 | |a Semi-conducteurs |x Attaque chimique. |0 (CaQQLa)201-0405299 | |
| 650 | 6 | |a Gravure par plasma. |0 (CaQQLa)201-0141599 | |
| 650 | 7 | |a Plasma etching. |2 fast |0 (OCoLC)fst01066327 | |
| 650 | 7 | |a Semiconductors |x Etching. |2 fast |0 (OCoLC)fst01112219 | |
| 653 | |a Electronic equipment |a Integrated circuits |a Construction |a Methods | ||
| 700 | 1 | |a Powell, Ronald A. | |
| 776 | 0 | 8 | |i Print version: |t Dry etching for microelectronics. |d Amsterdam ; New York : North-Holland Physics Pub. ; New York, N.Y. : Distributors for the USA and Canada, Elsevier Science Pub. Co., 1984 |w (DLC) 84001145 |w (OCoLC)10913832 |
| 830 | 0 | |a Materials processing, theory and practices ; |v v. 4. | |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9780444869050 |z Texto completo |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/bookseries/0167790X |z Texto completo |