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Modeling of film deposition for microelectronic applications /
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 22 volumes since 1963. The series contains quality studies of the properties of various thin filmsmaterials and systems. In order to be able to reflect the development of today's science an...
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
San Diego :
Academic Press,
�1996.
|
| Colección: | Thin films ;
v. 22. |
| Temas: | |
| Acceso en línea: | Texto completo Texto completo Texto completo |
MARC
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| 003 | OCoLC | ||
| 005 | 20231117014753.0 | ||
| 006 | m o d | ||
| 007 | cr cn||||||||| | ||
| 008 | 070802s1996 caua ob 001 0 eng d | ||
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| 082 | 0 | 4 | |a 530.4275 |2 22 |
| 245 | 0 | 0 | |a Modeling of film deposition for microelectronic applications / |c edited by Stephen Rossnagel. |
| 260 | |a San Diego : |b Academic Press, |c �1996. | ||
| 300 | |a 1 online resource (xiv, 291 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Thin films ; |v v. 22 | |
| 520 | |a Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 22 volumes since 1963. The series contains quality studies of the properties of various thin filmsmaterials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. | ||
| 505 | 0 | |a M.J. Brett, S.K. Dew, and T.J. Smy, Thin Film Microstructure and Process Simulation Using SIMBAD. S. Hamaguchi, Mathematical Methods for Thin Films Deposition Simulations. C.-C. Fang, V. Prasad, R.V. Joshi, F. Jones, and J.J. Hsieh, A Process Model for Sputter-Deposition of Thin Films Using Molecular Dynamics. T.S. Cale and V. Mahadev, Feature Scale Transport and Reaction during Low Pressure. Chapter References. Author Index. Subject Index. | |
| 504 | |a Includes bibliographical references and index. | ||
| 505 | 0 | 0 | |t Thin film microstructure and process simulation using SIMBAD / |r Michael J. Brett, Steven K. Dew, and Tom J. Smy -- |t Mathematical methods for thin film deposition simulations / |r S. Hamaguchi -- |t A process model for sputter deposition of thin films using molecular dynamics / |r C.-C. Fang [and others] -- |t Feature scale transport and reaction during low-pressure deposition processes / |r Timothy S. Cale and Vadali Mahadev. |
| 588 | 0 | |a Print version record. | |
| 506 | |3 Use copy |f Restrictions unspecified |2 star |5 MiAaHDL | ||
| 533 | |a Electronic reproduction. |b [Place of publication not identified] : |c HathiTrust Digital Library, |d 2011. |5 MiAaHDL | ||
| 538 | |a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. |u http://purl.oclc.org/DLF/benchrepro0212 |5 MiAaHDL | ||
| 583 | 1 | |a digitized |c 2011 |h HathiTrust Digital Library |l committed to preserve |2 pda |5 MiAaHDL | |
| 650 | 0 | |a Thin films |x Computer simulation |v Congresses. | |
| 650 | 7 | |a Thin films |x Computer simulation. |2 fast |0 (OCoLC)fst01150020 | |
| 650 | 7 | |a Couches minces. |2 ram | |
| 650 | 7 | |a Rev�etements. |2 ram | |
| 655 | 7 | |a Conference papers and proceedings. |2 fast |0 (OCoLC)fst01423772 | |
| 655 | 7 | |a Conference papers and proceedings. |2 lcgft | |
| 700 | 1 | |a Rossnagel, Stephen M. | |
| 776 | 0 | 8 | |i Print version: |t Modeling of film deposition for microelectronic applications. |d San Diego : Academic Press, �1996 |z 0125330227 |z 9780125330220 |w (OCoLC)35861306 |
| 776 | 0 | 8 | |i Online version: |t Modeling of film deposition for microelectronic applications. |d San Diego : Academic Press, �1996 |w (OCoLC)761142280 |
| 830 | 0 | |a Thin films ; |v v. 22. | |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9780125330220 |z Texto completo |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/bookseries/10794050/22 |z Texto completo |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/publication?issn=10794050&volume=22 |z Texto completo |