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200701s2013 xx o 000 0 eng |
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|z 9780080523422
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|z 9780750691727
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|a C20090261617
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|a 9780080523422
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|a UAMI
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|a Strausser, Yale,
|e author.
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|a Characterization in Silicon Processing /
|c Strausser, Yale.
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|a 1st edition.
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|b Newnes,
|c 2013.
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|a 1 online resource (240 pages)
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
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|a text file
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|a This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems.
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|f Copyright ©: Elsevier Science & Technology
|g 1993
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|a Made available through: Safari, an O'Reilly Media Company.
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|a Online resource; Title from title page (viewed October 22, 2013)
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|a O'Reilly
|b O'Reilly Online Learning: Academic/Public Library Edition
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|a Electric conductors.
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|a Semiconductor films.
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|a Silicon.
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|a Surface chemistry.
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|a Silicon
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|a Conducteurs électriques.
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|a Couches à semi-conducteurs.
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|a Silicium.
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|a Chimie des surfaces.
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|a electric conductor.
|2 aat
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|a silicon.
|2 aat
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|a Electric conductors
|2 fast
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|a Semiconductor films
|2 fast
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|a Silicon
|2 fast
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|a Surface chemistry
|2 fast
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|a Safari, an O'Reilly Media Company.
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|u https://learning.oreilly.com/library/view/~/9780080523422/?ar
|z Texto completo (Requiere registro previo con correo institucional)
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|a BATCHLOAD
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|a 92
|b IZTAP
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