Characterization in Silicon Processing /

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This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to disc...

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Detalles Bibliográficos
Autor principal: Strausser, Yale (Autor)
Autor Corporativo: Safari, an O'Reilly Media Company
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Newnes, 2013.
Edición:1st edition.
Temas:
Electric conductors.
Semiconductor films.
Silicon.
Surface chemistry.
Silicon
Conducteurs électriques.
Couches à semi-conducteurs.
Silicium.
Chimie des surfaces.
electric conductor.
silicon.
Electric conductors
Semiconductor films
Surface chemistry
Acceso en línea:Texto completo (Requiere registro previo con correo institucional)
Descripción
Sumario:This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems.
Descripción Física:1 online resource (240 pages)

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