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190104s2018 xx a go 000 0 eng |
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|a UKMGB
|b eng
|c UKMGB
|d OCLCO
|d OCLCF
|d OCLCQ
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|a GBB917627
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|a 019199853
|2 Uk
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|a 9781351832229
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|a 1351832220
|q (EPUB)
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| 024 |
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|a 10.1201/9781315216331
|2 doi
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0 |
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|a UKMGB
|b 019199853
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|a (OCoLC)1084394730
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|a 9781351832229
|b Ingram Content Group
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|a TEC
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|a 620.19204295
|2 23
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|a UAMI
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| 100 |
1 |
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|a Nakamura, Kenichiro
|c (Chemical engineer),
|e author.
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| 245 |
1 |
0 |
|a Photopolymers :
|b photoresist materials, processes, and applications /
|c Kenichiro Nakamura.
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| 264 |
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1 |
|a [Place of publication not identified] :
|b CRC Press,
|c 2018.
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| 300 |
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|a 1 online resource (189 pages :
|b 44 illustrations
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| 336 |
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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| 338 |
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|a online resource
|b cr
|2 rdacarrier
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|a Optics and photonics
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| 500 |
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|a <P>Introduction</P><P>About the Author</P><B><P>Basic Idea of Photopolymerization</P></B><P>Introduction</P><P>Radical Polymerization</P><P>Monomers for Photopolymerization</P><P>Initiators of Photopolymerization</P><P>Inhibition of Polymerization</P><P>Cationic Photopolymerization</P><P>Photocrosslinking</P><P>Scission of Polymers</P><P>References</P><B><P>Chemically Amplified Resists</P></B><P>Introduction</P><P>Chemical Amplification of Photopolymers</P><P>Polymers for Chemical Amplification</P><P>Photoacid Generator</P><P>References</P><B><P>Process of Chemically Amplified Resists</P></B><P>Introduction</P><P>Progress of Resolution Limit</P><P>Immersion Lithography</P><P>Double Patterning </P><P>EUV Lithography</P><P>Direct Self-Assembly (DSA)</P><P>References</P><B><P>Nanoimprinting</P></B><P>Introduction</P><P>Thermal Nanoimprinting</P><P>UV Nanoimprinting</P><P>Cationic Polymerization of UV Nanoimprinting</P><P>Ene-Thiol Polymerization of UV Nanoimprinting</P><P>Soft Lithography</P><P>References</P><B><P>Industrial Applications of Photopolymers</P></B><P>Introduction</P><P>Application to Electronics</P><P>Optical Adhesive Polymers</P><P>Holographic Photopolymers</P><P>Application to Medical Materials</P><P>Microelectromechanical Systems (MEMS)</P><P>References</P>
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| 590 |
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|a O'Reilly
|b O'Reilly Online Learning: Academic/Public Library Edition
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| 650 |
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0 |
|a Photopolymers.
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| 650 |
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0 |
|a Photoresists.
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| 650 |
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|a Photopolymerization.
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| 650 |
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|a Photopolymers
|x Industrial applications.
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| 650 |
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|a Microelectronics
|x Materials.
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| 650 |
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6 |
|a Photopolymères.
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| 650 |
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6 |
|a Résines photosensibles.
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| 650 |
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6 |
|a Photopolymérisation.
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| 650 |
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6 |
|a Photopolymères
|x Applications industrielles.
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| 650 |
|
6 |
|a Microélectronique
|x Matériaux.
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| 650 |
|
7 |
|a Microelectronics
|x Materials.
|2 fast
|0 (OCoLC)fst01019771
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| 650 |
|
7 |
|a Photopolymerization.
|2 fast
|0 (OCoLC)fst01062090
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| 650 |
|
7 |
|a Photopolymers.
|2 fast
|0 (OCoLC)fst01062092
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| 650 |
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7 |
|a Photopolymers
|x Industrial applications.
|2 fast
|0 (OCoLC)fst01062093
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| 650 |
|
7 |
|a Photoresists.
|2 fast
|0 (OCoLC)fst01062099
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| 856 |
4 |
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|u https://learning.oreilly.com/library/view/~/9781466517288/?ar
|z Texto completo (Requiere registro previo con correo institucional)
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|a 92
|b IZTAP
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