EUV lithography /

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Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an histor...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Bakshi, Vivek
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Bellingham, Wash. : Hoboken, NJ : SPIE Press ; John Wiley, ©2009.
Colección:SPIE monograph ; PM178.
Temas:
Ultraviolet radiation > Industrial applications.
Photolithography.
Optical coatings.
Rayonnement ultraviolet > Applications industrielles.
Photolithographie.
Revêtements optiques.
photolithography.
TECHNOLOGY & ENGINEERING > Mechanical.
Optical coatings
Photolithography
Ultraviolet radiation > Industrial applications
Acceso en línea:Texto completo
Tabla de Contenidos:
  • 1. EUV Lithography: A Historical Perspective / Hiroo Kinoshita and Obert Wood
  • Introduction
  • The Early Stage of Development: 1981 to 1992
  • The Second Stage of Development: 1993 to 1996
  • Other Developments in Japan and Europe
  • The Development of Individual Technologies
  • EUVL Conferences
  • Summary.
  • 2. EUV LLC: An Historical Perspective / Chuck Gwyn and Stefan Wurm
  • Introduction
  • Formation of the LLC
  • Program Structure
  • Program Results
  • Retrospective Observations
  • Status of EUV Development at the End of LLC
  • Summary.
  • 3. EUV Source Technology / Vivek Bakshi-- Introduction
  • EUV Source Requirements
  • DPP and LPP Source Technologies
  • EUV Source Performance
  • Summary and Future Outlook.
  • 4A. Optics and Multilayer Coatings for EUVL Systems / Regina Soufli, Saša Bajt, Russell M. Hudyma and John S. Taylor
  • Introduction
  • Properties of EUVL Systems.
  • 4B. Projection Systems for Extreme Ultraviolet Lithography / Russell M. Hudyma and Regina Soufli
  • General EUVL Optical Design Considerations
  • EUV Microsteppers
  • Engineering Test Stand (ETS)
  • Six-Mirror EUVL Projection Systems.
  • 4C. Specification, Fabrication, Testing, and Mounting of EUVL Optical Substrates / John S. Taylor and Regina Soufli
  • Introduction
  • Specification
  • Projection Optics
  • Effect of Substrate Errors on Imaging Performance
  • Low-Frequency (Figure) Errors
  • Mid-Spatial-Frequency Errors
  • High-Spatial-Frequency Errors
  • Influence of Coatings on Roughness Specification
  • Calculation of Surface Errors
  • Uniformity
  • Substrate Materials
  • Fabrication
  • Metrology
  • Mounting and Assembly
  • Alignment
  • Condenser Optics.
  • 4D. Multilayer Coatings for EUVL / Regina Soufli and Saša Bajt
  • Overview and History of EUV Multilayer Coatings
  • Choice of ML Materials and Wavelength Considerations
  • Multilayer Deposition Technologies
  • Theoretical design
  • High Reflectivity, Low Stress, and Thermal Stability Considerations
  • Optical Constants
  • Multilayer Thickness Specifications for Imaging and Condenser EUVL Mirrors.
  • 5. EUV Optical Testing / Kenneth A. Goldberg
  • Introduction
  • Target Accuracy
  • Techniques for Angstrom-scale EUV Wavefront Measurement Accuracy
  • Intercomparison
  • Future Directions.
  • 6A. Optics Contamination / Saša Bajt
  • Introduction
  • Fundamentals of Optics Contamination
  • Optics Contamination Control
  • Summary and Future Outlook.
  • 6B. Grazing Angle Collector Contamination / Valentino Rigato
  • Introduction
  • Collector Lifetime Status and Challenges
  • Summary.
  • 6C. Normal Incidence (Multilayer) Collector Contamination / David N. Ruzic and Shailendra N. Srivastava
  • Introduction
  • Overview of Normal-Incidence Collector Mirrors
  • Collector Performance
  • Summary.
  • 7. EUV Mask and Mask Metrology / Han-Ku Cho and Jinho Ahn
  • Introduction
  • EUV Mask Structure and Process Flow
  • Mask Substrate
  • Mask Blank Fabrication
  • Absorber Stack and Backside Conductive Coating
  • Mask Patterning
  • Mask Cleaning
  • Advanced Mask Structure
  • Summary and Future Outlook.
  • 8. Photoresists for Extreme Ultraviolet Lithography / Robert L. Brainard
  • Introduction
  • Earliest EUV Resist Imaging
  • Absorption Coefficients of EUV Photoresists
  • Multilayer Resists and Pattern Transfer
  • Resist Types
  • PAGs and Acids
  • Line Edge Roughness
  • Summary and Future Outlook.
  • 9. High-Resolution EUV Imaging Tools for Resist Exposure and Aerial Image Monitoring / Malcolm Gower
  • Introduction
  • EUV Tool Design Considerations
  • EUV Microstepper
  • Reticle Imaging Microscope
  • Summary and Future Outlook.
  • 10. Fundamentals of the EUVL Scanner / Kazuya Ota
  • Introduction
  • Illumination Optics
  • Projection Optics
  • Stages
  • Sensors
  • Handling Systems
  • Vacuum and Environment System
  • Budgets
  • Summary.
  • 11. EUVL System Patterning Performance / Patrick Naulleau, John E. Bjorkholm, and Manish Chandhok
  • Introduction: The Benefits of EUV Imaging
  • Imaging with the 0.1-NA ETS Optic
  • Imaging with the 0.3-NA MET Optic
  • System Contributors to Line Edge Roughness
  • Flare in EUVL Systems
  • Summary.
  • 12. Lithography Cost of Ownership / Phil Seidel
  • Cost of Ownership Overview
  • Lithography: Historical Cost and Price Trends
  • Major Lithography CoO Parameter and Productivity Drivers
  • General Observations on Lithography Cell and CoO Improvements (Past Decade)
  • CoO Considerations for Future Lithography Technologies
  • Summary
  • Appendix: Example Case Studies of Lithography CoO Calculations.

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