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Optical lithography : here is why /
This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the...
| Clasificación: | Libro Electrónico |
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| Autor principal: | |
| Autor Corporativo: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Bellingham, Wash. :
SPIE,
2010.
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| Colección: | SPIE monograph ;
PM190. |
| Temas: | |
| Acceso en línea: | Texto completo |
| Sumario: | This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. |
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| Descripción Física: | 1 online resource (xiv, 477 pages) : illustrations |
| Bibliografía: | Includes bibliographical references and index. |
| ISBN: | 9780819481825 0819481823 9781615837274 1615837272 |