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Characterization in silicon processing /

This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to disc...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Strausser, Yale
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Boston : Greenwich : Butterworth-Heinemann ; Manning, ©1993.
Colección:Materials characterization series.
Temas:
Acceso en línea:Texto completo