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Statistical Performance Analysis and Modeling Techniques for Nanometer VLSI Designs

Since process variation and chip performance uncertainties have become more pronounced as technologies scale down into the nanometer regime, accurate and efficient modeling or characterization of variations from the device to the architecture level have  become imperative for the successful design o...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autores principales: Shen, Ruijing (Autor), Tan, Sheldon X.-D (Autor), Yu, Hao (Autor)
Autor Corporativo: SpringerLink (Online service)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: New York, NY : Springer New York : Imprint: Springer, 2012.
Edición:1st ed. 2012.
Temas:
Acceso en línea:Texto Completo