Cargando…
Design for Manufacturability and Yield for Nano-Scale CMOS
As we approach the 32 nm CMOS technology node the design and manufacturing communities are dealing with a lithography system that has to print circuit artifacts that are significantly less than half the wavelength of the light source used, with new materials, with tighter pitches, and higher aspect...
| Clasificación: | Libro Electrónico |
|---|---|
| Autores principales: | , |
| Autor Corporativo: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Dordrecht :
Springer Netherlands : Imprint: Springer,
2007.
|
| Edición: | 1st ed. 2007. |
| Colección: | Integrated Circuits and Systems,
|
| Temas: | |
| Acceso en línea: | Texto Completo |