Design for Manufacturability and Yield for Nano-Scale CMOS

As we approach the 32 nm CMOS technology node the design and manufacturing communities are dealing with a lithography system that has to print circuit artifacts that are significantly less than half the wavelength of the light source used, with new materials, with tighter pitches, and higher aspect...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autores principales: Chiang, Charles (Autor), Kawa, Jamil (Autor)
Autor Corporativo: SpringerLink (Online service)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Dordrecht : Springer Netherlands : Imprint: Springer, 2007.
Edición:1st ed. 2007.
Colección:Integrated Circuits and Systems,
Temas:
Electronic circuits.
Electronics.
Computer-aided engineering.
Microprocessors.
Computer architecture.
Software engineering.
Nanotechnology.
Electronic Circuits and Systems.
Electronics and Microelectronics, Instrumentation.
Computer-Aided Engineering (CAD, CAE) and Design.
Processor Architectures.
Software Engineering.
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