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Defects in HIgh-k Gate Dielectric Stacks Nano-Electronic Semiconductor Devices /

The goal of this NATO Advanced Research Workshop (ARW) entitled "Defects in Advanced High-k Dielectric Nano-electronic Semiconductor Devices", which was held in St. Petersburg, Russia, from July 11 to 14, 2005, was to examine the very complex scientific issues that pertain to the use of ad...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor Corporativo: SpringerLink (Online service)
Otros Autores: Gusev, Evgeni (Editor )
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Dordrecht : Springer Netherlands : Imprint: Springer, 2006.
Edición:1st ed. 2006.
Colección:NATO Science Series II: Mathematics, Physics and Chemistry, Mathematics, Physics and Chemistry ; 220
Temas:
Acceso en línea:Texto Completo