Cita APA (7a ed.)

Posseme, N. (2017). Plasma etching processes for CMOS device realization. ISTE Press ; Elsevier.

Cita Chicago Style (17a ed.)

Posseme, Nicolas. Plasma Etching Processes for CMOS Device Realization. London, UK : Kidlington, Oxford, UK: ISTE Press ; Elsevier, 2017.

Cita MLA (8a ed.)

Posseme, Nicolas. Plasma Etching Processes for CMOS Device Realization. ISTE Press ; Elsevier, 2017.