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20231120111644.0 |
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m o d |
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cr cnu---unuuu |
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140627s1972 nyu o 000 0 eng d |
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|a OPELS
|b eng
|e rda
|e pn
|c OPELS
|d OCLCF
|d YDXCP
|d EBLCP
|d DEBSZ
|d OCLCQ
|d OCLCO
|d MERUC
|d OCLCQ
|d OCLCO
|d OCLCQ
|d OCLCO
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|c (S
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|a 895430745
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|a 9781483214726
|q (electronic bk.)
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|a 1483214729
|q (electronic bk.)
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|z 0120029030
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|z 9780120029037
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|a (OCoLC)881851497
|z (OCoLC)895430745
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|a QC176
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|a 621.3815/2
|2 22
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|a Applied solid state science :
|b advances in materials and device research /
|c edited by Raymond Wolfe. Vol. 3.
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|a New York ;
|a London :
|b Academic Press,
|c 1972.
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|a 1 online resource (xii, 403 pages)
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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|a Print version record.
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|6 880-01
|a Front Cover; Applied Solid State Science Advances in Materials and Device Research; Copyright Page; Table of Contents; LIST OF CONTRIBUTORS; PREFACE; CONTENTS OF PREVIOUS VOLUMES; ARTICLES PLANNED FOR FUTURE VOLUMES; Chapter 1. Physics of Multilayer-Gate IGFET Memories; I. Introduction; II. IGFET Characteristics; III. Oxide Instabilities; IV. Current Transport through Insulators; V. The Memory Element; References; Chapter 2. Acousto-optics; I. Introduction; II. General Formulation; III. Strong Interaction; IV. Weak Interaction; V. Materials; VI. Applications; VII. Special Topics; Appendix A.
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|a III. Frequency Dependence of the Electrooptic EffectIV. Electronic Electrooptic Effect (Nonlinear Optic Effect); V. Theory of the Electrooptic Effect; VI. Tabulation of Experimental Electrooptic Data; VII. Electrooptic Device Considerations; VIII. Conclusions; List of Symbols; Note Added in Proof; Reference; AUTHOR INDEX; SUBJECT INDEX.
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|a Applied Solid State Science: Advances in Materials and Device Research, Volume 3 covers reviews that are directly related to the two devices which are the epitome of applied solid state science - the transistor and the laser. The book discusses the physics of multilayer-gate IGFET memories; the application of the transient charge technique in drift velocity; and trapping in semiconductors and in materials used in xerography, nuclear particle detectors, and space-charge-limited devices; as well as thin film transistors. The text describes the manipulation of laser beams in solids and discusses.
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|a Semiconductors.
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|a Semiconductors
|0 (DNLM)D012666
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|a Semi-conducteurs.
|0 (CaQQLa)201-0318258
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|a semiconductor.
|2 aat
|0 (CStmoGRI)aat300015117
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|a Semiconductors
|2 fast
|0 (OCoLC)fst01112198
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|a Semiconducteurs.
|2 ram
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|a Wolfe, Raymond.
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776 |
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|i Print version:
|t Applied solid state science
|z 0120029030
|w (OCoLC)26088952
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856 |
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|u https://sciencedirect.uam.elogim.com/science/book/9780120029037
|z Texto completo
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|6 505-01/(S
|a Appendix ΒReferences; Chapter 3. Drift Velocity and Trapping in Semiconductors-Transient Charge Technique; I. Introduction; II. Experimental Method; III. Drift Velocity; IV. Trapping Processes; V. Overview; Appendix A. Circuit Considerations; Appendix B. Transient Response; Appendix C. Pulse Rise Time; Appendix D. Measurement of the Energy to Create a Pair in Silicon, Germanium, and CdTe; References; Chapter 4. Electrooptical and Nonlinear Optical Properties of Crystals; I. Introduction; II. Phenomenological Description of Electrooptic Phenomena.
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