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Lightwave communications technology. Part A, Material growth technologies /

SEMICONDUCTORS & SEMIMETALS V22.

Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Tsang, W. T.
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Orlando, Fla. : Academic Press, 1985.
Colección:Semiconductors and semimetals ; v. 22A, pt. A.
Temas:
Acceso en línea:Texto completo
Texto completo

MARC

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245 0 0 |a Lightwave communications technology.  |n Part A,  |p Material growth technologies /  |c volume editor, W.T. Tsang. 
246 3 |a Material growth technologies 
260 |a Orlando, Fla. :  |b Academic Press,  |c 1985. 
300 |a 1 online resource (xix, 416 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a Semiconductors and semimetals ;  |v v. 22A, pt. A 
504 |a Includes bibliographical references and indexes. 
588 0 |a Print version record. 
505 0 |a Front Cover; Lightwave Communications Technology; Copyright Page; Contents; List of Contributors; Treatise Foreword; Foreword; Preface; Chapter 1. The Liquid-Phase Epitaxial Growth of InGaAsP; I. Introduction; II. In-Ga-As-P and In-Ga-As Phase Diagrams; III. Growth of Lattice-Matched InGaAsP and InGaAs Layers; IV. Growth of Misfit-Dislocation-Free Wafers; V. Growth Rate; VI. Growth of High-Purity Epitaxial Layers; VII. Other Features of the Growth; VIII. Direct Growth of InP on (111)A In0.53Ga0.47As; IX. Concluding Comments; References 
505 8 |a Chapter 2. Molecular Beam Epitaxy for III-V Compound SemiconductorsI. Historical Background of Molecular Beam Epitaxy; II. The Basic Molecular Beam Epitaxy Process; III. Growth Apparatus; IV. In Situ Surface Diagnostic Techniques; V. Substrate Preparation; VI. Growth Conditions for Ill-V Compounds; VII. Transport and Optical Properties of Single Layers; VIII. Transport and Optical Properties of Quantum Well Structures; IX. MBE-Grown III-V Semiconductor Lasers; X. Novel Laser Structures; XI . Novel Photodetectors; XII. Concluding Remarks; References 
505 8 |a Chapter 3. Organometallic Vapor-Phase Epitaxial Growth of III-V SemiconductorsI. Introduction; II. Growth Process; III. Specific Materials and Devices; IV. Summary and Future Directions; References; Chapter 4. Halide and Chloride Transport Vapor-Phase Deposition of InGaAsP and GaAs; I. Introduction; II. Halide Transport; III. Thermodynamic Model; IV. Aspects of the Growth Mechanisms; V. Conclusion; Appendix; References; Chapter 5. Low-Pressure Metallo-Organic Chemical Vapor Deposition of GaxIn1-xAsyP1-y Alloys; I. Introduction; II. Growth Technique; III. Growth and Characterization of InP 
505 8 |a IV. Growth and characterization of GaInAsV. Growth and Characterization of GaInAsP; VI. Conclusion; References; Chapter 6. Defects in III -- V Compound Semiconductors; I. Introduction; II. Native and Process-Induced Defects in Optoelectronic Materials; III. Electronic Properties of Dislocations; IV. Degradation-Induced Defects; V. Conclusion; References; Index; Contents of Volume 22; Contents of Previous Volumes 
520 |a SEMICONDUCTORS & SEMIMETALS V22. 
546 |a English. 
650 0 |a Telecommunication systems. 
650 0 |a Laser communication systems. 
650 0 |a Integrated optics. 
650 6 |a Syst�emes de t�el�ecommunications.  |0 (CaQQLa)201-0023227 
650 6 |a Syst�emes de communication �a laser.  |0 (CaQQLa)201-0016342 
650 6 |a Optique int�egr�ee.  |0 (CaQQLa)201-0035088 
650 7 |a telecommunication systems.  |2 aat  |0 (CStmoGRI)aat300008610 
650 7 |a Integrated optics  |2 fast  |0 (OCoLC)fst00975646 
650 7 |a Laser communication systems  |2 fast  |0 (OCoLC)fst00992797 
650 7 |a Telecommunication systems  |2 fast  |0 (OCoLC)fst01146038 
700 1 |a Tsang, W. T. 
776 0 |z 0127521224 
830 0 |a Semiconductors and semimetals ;  |v v. 22A, pt. A. 
856 4 0 |u https://sciencedirect.uam.elogim.com/science/book/9780127521220  |z Texto completo 
856 4 0 |u https://sciencedirect.uam.elogim.com/science/bookseries/00808784/22/part/PA  |z Texto completo