Advances in electronics and electron physics. Volume 54 /

ADV ELECTRONICS ELECTRON PHYSICS V54.

Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Marton, L. (Ladislaus), 1901-, Marton, C.
Formato: Electrónico eBook
Idioma:Inglés
Publicado: New York ; London : Academic Press, �1980.
Colección:Advances in electronics and electron physics ; v. 54
Temas:
Electronics.
Electron spectroscopy.
Electronics
�Electronique.
Spectroscopie �electronique.
Electron spectroscopy
Acceso en línea:Texto completo

MARC

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020 |a 9780120146543  |q (electronic bk.) 
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245 0 0 |a Advances in electronics and electron physics.  |n Volume 54 /  |c edited by L. Marton and C. Marton. 
260 |a New York ;  |a London :  |b Academic Press,  |c �1980. 
300 |a 1 online resource (xi, 318 pages) :  |b illustrations. 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 0 |a Advances in electronics and electron physics ;  |v v. 54 
504 |a Includes bibliographical references and index. 
588 0 |a Print version record. 
505 0 |a Cover; Contents; Contributors to Volume 54; Foreword; Chapter 1. Magnetic Reconnection Experiments; I. Prolog; II. Introduction; III. Historical Perspective Prior to 1970; IV. Reconnection Theory; V. Reconnection Experiments; VI. Discussion and Conclusions; Appendix I. A Simple Example of an X Point; Appendix II. Reconnection Jargon; Appendix III. Impulsive Flux Transfer and Circuit Transients; References; Chapter 2. Electron Physics in Device Microfabrication. II Electron Resists, X-Ray Lithography, and Electron Beam Lithography Update; I. Introduction 
505 8 |a II. Interactions between a Focused Electron Beam and a Resist-Covered WaferIII. X-Ray Lithography; IV. Recent Work in Electron Beam Lithography; V. The Relative Roles of X-Ray and Electron Beam Lithography Systems with High Throughput; References; Chapter 3. Solar Physics; I. Introduction; II. The Solar Interior; Ill. The Quiet Solar Atmosphere; IV. Solar Activity; References; Chapter 4. Aspects of Resonant Multiphoton Processes; I. Introduction; II. Formal Theory of Multiphoton Processes; III. The Quantum Theory of Resonant Two-Photon Processes; IV. The Effect of Nonresonant States 
505 8 |a V. Higher-Order ProcessesVI. Semiclassical Approaches; VII. Multiple Resonances; VIII. Field Statistics and Bandwidth Effects; IX. Experimental Investigations of Resonant Multiphoton Processes; References; Chapter 5. Fundamentals and Applications of Auger Electron Spectroscopy; I. Introduction; II. Fundamentals; III. Experimental Approach; IV. Quantitative AES; V. Sample Damage; VI. Applications; VII. Summary; References; Author Index; Subject Index 
520 |a ADV ELECTRONICS ELECTRON PHYSICS V54. 
546 |a English. 
650 0 |a Electronics. 
650 0 |a Electron spectroscopy. 
650 2 |a Electronics  |0 (DNLM)D004581 
650 6 |a �Electronique.  |0 (CaQQLa)201-0001759 
650 6 |a Spectroscopie �electronique.  |0 (CaQQLa)201-0053159 
650 7 |a Electron spectroscopy  |2 fast  |0 (OCoLC)fst00906707 
650 7 |a Electronics  |2 fast  |0 (OCoLC)fst00907538 
700 1 |a Marton, L.  |q (Ladislaus),  |d 1901- 
700 1 |a Marton, C. 
776 0 8 |i Print version:  |t Advances in electronics and electron physics.  |d New York ; London : Academic Press, �1980  |w (DLC) 49007504 
856 4 0 |u https://sciencedirect.uam.elogim.com/science/book/9780120146543  |z Texto completo 

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