CW beam processing of silicon and other semiconductors /
SEMICONDUCTORS & amp; SEMIMETALS V17.
Clasificación: | Libro Electrónico |
---|---|
Otros Autores: | |
Formato: | Electrónico eBook |
Idioma: | Inglés |
Publicado: |
Orlando, Fla. :
Academic Press,
1984.
|
Colección: | Semiconductors and semimetals ;
v. 17. |
Temas: | |
Acceso en línea: | Texto completo Texto completo |
MARC
LEADER | 00000cam a2200000 a 4500 | ||
---|---|---|---|
001 | SCIDIR_ocn646523517 | ||
003 | OCoLC | ||
005 | 20231117033209.0 | ||
006 | m o d | ||
007 | cr un||||a|a|| | ||
008 | 100709s1984 flua ob 001 0 eng d | ||
040 | |a OCLCE |b eng |e pn |c OCLCE |d N$T |d UBY |d IDEBK |d E7B |d OCLCQ |d OPELS |d OCLCQ |d OCLCF |d OCLCQ |d EBLCP |d YDXCP |d OCLCQ |d DEBSZ |d MERUC |d OCLCQ |d LEAUB |d OCLCQ |d OCLCO |d OCL |d OCLCQ |d OCLCO | ||
019 | |a 297447842 |a 298442916 |a 505097029 |a 644070498 |a 646758208 |a 808732744 |a 846182483 | ||
020 | |a 9780080864075 |q (electronic bk.) | ||
020 | |a 0080864074 |q (electronic bk.) | ||
020 | |a 0127521178 |q (electronic bk.) | ||
020 | |a 9780127521176 |q (electronic bk.) | ||
035 | |a (OCoLC)646523517 |z (OCoLC)297447842 |z (OCoLC)298442916 |z (OCoLC)505097029 |z (OCoLC)644070498 |z (OCoLC)646758208 |z (OCoLC)808732744 |z (OCoLC)846182483 | ||
042 | |a dlr | ||
050 | 4 | |a QC611.8.S5 |b C9 1984 | |
072 | 7 | |a SCI |x 021000 |2 bisacsh | |
082 | 0 | 4 | |a 537.6/22 |2 22 |
245 | 0 | 0 | |a CW beam processing of silicon and other semiconductors / |c volume editor, James F. Gibbons. |
260 | |a Orlando, Fla. : |b Academic Press, |c 1984. | ||
300 | |a 1 online resource (xii, 458 pages) : |b illustrations | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a computer |b c |2 rdamedia | ||
338 | |a online resource |b cr |2 rdacarrier | ||
490 | 1 | |a Semiconductors and semimetals ; |v v. 17 | |
504 | |a Includes bibliographical references and index. | ||
505 | 0 | |a Beam processing of silicon / J.F. Gibbons -- Temperature distributions and solid phase reaction rates produced by scanning CW beams / A. Lietoila [and others] -- Applications of CW beam processing to ion implanted crystalline silicon / A. Lietoila, J.F. Gibbons -- Electronic defects in CW transient thermal processed silicon / N.M. Johnson -- Beam recrystallized polycrystalline silicon / K.F. Lee, T.J. Stultz, J.F. Gibbons -- Metal-silicon reactions and silicide formation / T. Shibata [and others] -- CW bean processing of gallium arsenide / Y.I. Nissim, J.F. Gibbons. | |
506 | |3 Use copy |f Restrictions unspecified |2 star |5 MiAaHDL | ||
533 | |a Electronic reproduction. |b [Place of publication not identified] : |c HathiTrust Digital Library, |d 2010. |5 MiAaHDL | ||
538 | |a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. |u http://purl.oclc.org/DLF/benchrepro0212 |5 MiAaHDL | ||
583 | 1 | |a digitized |c 2010 |h HathiTrust Digital Library |l committed to preserve |2 pda |5 MiAaHDL | |
588 | 0 | |a Print version record. | |
520 | |a SEMICONDUCTORS & amp; SEMIMETALS V17. | ||
650 | 0 | |a Silicon. | |
650 | 0 | |a Semiconductors. | |
650 | 0 | |a Lasers |x Industrial applications. | |
650 | 2 | |a Silicon |0 (DNLM)D012825 | |
650 | 2 | |a Semiconductors |0 (DNLM)D012666 | |
650 | 6 | |a Lasers |x Applications industrielles. |0 (CaQQLa)201-0259323 | |
650 | 6 | |a Silicium. |0 (CaQQLa)201-0052755 | |
650 | 6 | |a Semi-conducteurs. |0 (CaQQLa)201-0318258 | |
650 | 7 | |a silicon. |2 aat |0 (CStmoGRI)aat300011769 | |
650 | 7 | |a semiconductor. |2 aat |0 (CStmoGRI)aat300015117 | |
650 | 7 | |a SCIENCE |x Physics |x Electricity. |2 bisacsh | |
650 | 7 | |a Lasers |x Industrial applications |2 fast |0 (OCoLC)fst00992853 | |
650 | 7 | |a Semiconductors |2 fast |0 (OCoLC)fst01112198 | |
650 | 7 | |a Silicon |2 fast |0 (OCoLC)fst01118631 | |
650 | 7 | |a Lasers �a gaz |x Applications scientifiques. |2 ram | |
650 | 7 | |a Faisceaux laser. |2 ram | |
650 | 7 | |a Semiconducteurs. |2 ram | |
650 | 7 | |a Silicium. |2 ram | |
650 | 7 | |a Non-m�etaux. |2 ram | |
700 | 1 | |a Gibbons, James F. | |
776 | 0 | 8 | |i Print version: |t CW beam processing of silicon and other semiconductors. |d Orlando, Fla. : Academic Press, 1984 |w (OCoLC)11683740 |
830 | 0 | |a Semiconductors and semimetals ; |v v. 17. | |
856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9780127521176 |z Texto completo |
856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/bookseries/00808784/17 |z Texto completo |