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Vacuum technology and applications /

Bibliographic Details
Call Number:Libro Electrónico
Main Author: Hucknall, D. J. (Author)
Format: Electronic eBook
Language:Inglés
Published: Oxford ; Boston : Butterworth-Heinemann, 1991.
Subjects:
Online Access:Texto completo
Table of Contents:
  • Front Cover
  • Vacuum Technology and Applications
  • Copyright Page
  • Table of Contents
  • Preface
  • Acknowledgments
  • Chapter 1. Introduction
  • 1.1 General
  • 1.2 The gaseous state
  • 1.3 Gas flow
  • 1.4 Vacuum system characteristics
  • References
  • Chapter 2. Vacuum pumps (rough�a�?medium range)
  • 2.1 General introduction
  • 2.2 Rotary pumps
  • 2.3 Roots vacuum pumps
  • 2.4 Dry vacuum pumps
  • References
  • Chapter 3. Vacuum pumps (high�a�?ultra-high range)
  • 3�A�1 General introduction
  • 3.2 Gas transfer pumps
  • 3.3 Entrapment pumps
  • 7.2 Vacuum technology in the semiconductor industry7.3 Vacuum technology in metallurgical processes
  • 7.4 Vacuum technology in the chemical industry
  • References
  • Chapter 8. Appendix: units, conversion factors and other data
  • 8.1 Units of pressure
  • 8.2 Amount of substance
  • 8.3 PNEUROP specifications for the characterization of vacuum pumps
  • Index