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Electron collisions with molecules in gases : applications to plasma diagnostics and modeling /
This series, established in 1965, is concerned with recent developments in the general area of atomic, molecular, and optical physics. The field is in a state of rapid growth, as new experimental and theoretical techniques are used on many old and new problems. Topics covered also include related ap...
| Call Number: | Libro Electrónico |
|---|---|
| Other Authors: | , , |
| Format: | Electronic eBook |
| Language: | Inglés |
| Published: |
San Diego :
Academic Press,
�2001.
|
| Series: | Advances in atomic, molecular, and optical physics ;
44. |
| Subjects: | |
| Online Access: | Texto completo Texto completo Texto completo |
Table of Contents:
- Front Cover; Advances in Atomic, Molecular and Optical Physics; Copyright Page; Contents; Contributors; Preface; Chapter 1. Mechanisms of Electron Transport in Electrical Discharges and Electron Collision Cross Sections; I. Introduction; II. Major Characteristics of Collisions and Reactions in Discharges and Plasmas; III. Cross Sections and Reaction Rate Constants of Atomic and Molecular Processes; IV. Measurements of Electron Collision Cross Sections and Illustrative Results; V. Measurements of Partial Cross Sections with the Use of the Appearance Potential in Mass Spectrometry
- VI. Measurements of Cross Sections for the Production of Positive and Negative IonsVII. Outlook; VIII. Acknowledgments; IX. References; Chapter 2. Theoretical Consideration of Plasma-Processing Processes; I. Introduction; II. An Example of Electron-Molecule Scattering; III. Overview of Theoretical Framework; IV. Current Level of the Accuracy of Theoretical Approaches; V. Excited Species; VI. Perspective and Conclusion; VII. Acknowledgment; VIII. References; Chapter 3. Electron Collision Data for Plasma-Processing Gases; I. Introduction; II. Plasma-Processing Gases; III. Data Assessment
- IV. Assessed Cross Sections and CoefficientsV. Boltzmann-Code-Generated Collision Cross-Section Sets; VI. Conclusions; VII. References; Chapter 4. Radical Measurements in Plasma Processing; I. Introduction; II. Summary of Recent Developments in Measurement Methods for Radicals in Plasma Processing; III. Details of in Situ Measurement Methods for Radicals in Processing Plasmas; IV. Representative Results of CFx and SiHx Radicals in Processing Plasmas; V. Conclusions; VI. References; Chapter 5. Radio-Frequency Plasma Modeling for Low-Temperature Processing; I. Introduction
- II. Radio-Frequency Electron Transport TheoryIII. Modeling of Radio-Frequency Plasmas; IV. Conclusions; V. Acknowledgments; VI. References; Chapter 6. Electron Interactions with Excited Atoms and Molecules; I. Introduction; II. Electron Scattering from Excited Atoms; III. Electron-Impact Ionization of Excited Atoms; IV. Electron Scattering from Excited Molecules; V. Electron-Impact Ionization of Excited Molecules; VI. Electron Attachment to Excited Molecules; VII. Concluding Remarks; VIII. Acknowledgment; IX. Appendix A; X. References; Subject Index; Contents of Volumes in this Series