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Characterization in silicon processing /

This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to disc...

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Détails bibliographiques
Cote:Libro Electrónico
Autres auteurs: Strausser, Yale
Format: Électronique eBook
Langue:Inglés
Publié: Boston : Greenwich : Butterworth-Heinemann ; Manning, �1993.
Collection:Materials characterization series.
Sujets:
Accès en ligne:Texto completo