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Characterization in silicon processing /
This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to disc...
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Boston : Greenwich :
Butterworth-Heinemann ; Manning,
�1993.
|
| Colección: | Materials characterization series.
|
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
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| 245 | 0 | 0 | |a Characterization in silicon processing / |c editor, Yale Strusser ; consulting editors, C.R. Brundle, Gary E. McGuire ; managing editor, Lee E. Fitzpatrick. |
| 260 | |a Boston : |b Butterworth-Heinemann ; |a Greenwich : |b Manning, |c �1993. | ||
| 300 | |a 1 online resource (xiii, 240 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Materials characterization series | |
| 504 | |a Includes bibliographical references and index. | ||
| 588 | 0 | |a Print version record. | |
| 506 | |3 Use copy |f Restrictions unspecified |2 star |5 MiAaHDL | ||
| 533 | |a Electronic reproduction. |b [Place of publication not identified] : |c HathiTrust Digital Library, |d 2010. |5 MiAaHDL | ||
| 538 | |a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. |u http://purl.oclc.org/DLF/benchrepro0212 |5 MiAaHDL | ||
| 583 | 1 | |a digitized |c 2010 |h HathiTrust Digital Library |l committed to preserve |2 pda |5 MiAaHDL | |
| 520 | |a This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems. | ||
| 650 | 0 | |a Silicon. | |
| 650 | 0 | |a Electric conductors. | |
| 650 | 0 | |a Semiconductor films. | |
| 650 | 0 | |a Surface chemistry. | |
| 650 | 2 | |a Silicon |0 (DNLM)D012825 | |
| 650 | 6 | |a Silicium. |0 (CaQQLa)201-0052755 | |
| 650 | 6 | |a Conducteurs �electriques. |0 (CaQQLa)201-0004531 | |
| 650 | 6 | |a Couches �a semi-conducteurs. |0 (CaQQLa)201-0087607 | |
| 650 | 6 | |a Chimie des surfaces. |0 (CaQQLa)201-0000376 | |
| 650 | 7 | |a silicon. |2 aat |0 (CStmoGRI)aat300011769 | |
| 650 | 7 | |a electric conductor. |2 aat |0 (CStmoGRI)aat300015116 | |
| 650 | 7 | |a SCIENCE |x Chemistry |x Inorganic. |2 bisacsh | |
| 650 | 7 | |a Electric conductors. |2 fast |0 (OCoLC)fst00904587 | |
| 650 | 7 | |a Semiconductor films. |2 fast |0 (OCoLC)fst01112128 | |
| 650 | 7 | |a Silicon. |2 fast |0 (OCoLC)fst01118631 | |
| 650 | 7 | |a Surface chemistry. |2 fast |0 (OCoLC)fst01139210 | |
| 650 | 7 | |a Silicone |2 gnd |0 (DE-588)4127342-4 | |
| 653 | 0 | |a Silicon | |
| 700 | 1 | |a Strausser, Yale. | |
| 776 | 0 | 8 | |i Print version: |t Characterization in silicon processing. |d Boston : Butterworth-Heinemann ; Greenwich : Manning, �1993 |z 0750691727 |
| 830 | 0 | |a Materials characterization series. | |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9780080523422 |z Texto completo |