Extreme ultraviolet lithography /

"Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL expe...

Full description

Bibliographic Details
Call Number:Libro Electrónico
Other Authors: Wu, Banqiu, Kumar, Ajay, 1962-, Eynon, Benjamin G., Naulleau, Patrick, Richardson, Martin, La Fontaine, Bruno, Yulin, Sergiy, Silver, Richard M., Vladar, Andras E., Kamberian, Henry
Format: Electronic eBook
Language:Inglés
Published: New York, N.Y. : McGraw-Hill Education, [2009]
Edition:First edition.
Series:McGraw-Hill's AccessEngineering.
Subjects:
Extreme ultraviolet lithography.
Integrated circuits > Masks.
Integrated circuits > Design and construction.
Electronic books.
Online Access:Texto completo
Description
Summary:"Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL experts, the reference contains contributions by prominent engineers at leading semi-conductor manufacturers such as Intel and ASM Lithography.Designed to help you optimize EUVL, Extreme Ultraviolet Lithography covers EUV lithography tools, EUV printer, EUV sources, multilayer EUV, EU Voptics, defect control, resist, mask techniques, and more.".
Item Description:Print version c2009.
Physical Description:1 online resource (xiv, 465 pages) : illustrations.
Also available in print edition.
Bibliography:Includes bibliographical references and index.
ISBN:0071664793
9780071549189
0071549188 (print-ISBN)

Similar Items