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Chemical vapour deposition : precursors, processes and applications /
Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD)...
| Clasificación: | Libro Electrónico |
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| Otros Autores: | , |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Cambridge, UK :
Royal Society of Chemistry,
©2009.
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| Temas: | |
| Acceso en línea: | Texto completo |
| Sumario: | Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from thes. |
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| Descripción Física: | 1 online resource (xv, 582 pages) : illustrations, plans |
| Bibliografía: | Includes bibliographical references and index. |
| ISBN: | 9781847558794 1847558798 9781621987031 1621987035 0854044655 9780854044658 |
| Acceso: | University staff and students only. Requires University Computer Account login off-campus. |