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Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /

An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.

Détails bibliographiques
Cote:Libro Electrónico
Autres auteurs: Rossnagel, Stephen M., Cuomo, J. J., Westwood, William D. (William Dickson), 1937-
Format: Électronique eBook
Langue:Inglés
Publié: Park Ridge, N.J. : Noyes Publications, ©1990.
Collection:Materials science and process technology series.
Sujets:
Accès en ligne:Texto completo

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