Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /

An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.

Bibliographic Details
Call Number:Libro Electrónico
Other Authors: Rossnagel, Stephen M., Cuomo, J. J., Westwood, William D. (William Dickson), 1937-
Format: Electronic eBook
Language:Inglés
Published: Park Ridge, N.J. : Noyes Publications, ©1990.
Series:Materials science and process technology series.
Subjects:
Plasma engineering.
Semiconductors > Etching.
Plasma etching.
Technique des plasmas.
Semi-conducteurs > Attaque chimique.
Gravure par plasma.
Plasma engineering
Plasma etching
Semiconductors > Etching
Online Access:Texto completo

Internet

Texto completo

Items no disponibles

Holdings details from

Similar Items