Cita APA (7a ed.)

International Symposium on Ultra Clean Processing of Semiconductor Surfaces Ostend, Belgium, Mertens, P., Meuris, M., & Heyns, M. (2012). Ultra clean processing of semiconductor surfaces X: Selected, peer reviewed papers from the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 20-22, 2010, Ostend, Belgium. TTP.

Cita Chicago Style (17a ed.)

International Symposium on Ultra Clean Processing of Semiconductor Surfaces Ostend, Belgium, Paul Mertens, Marc Meuris, y Marc Heyns. Ultra Clean Processing of Semiconductor Surfaces X: Selected, Peer Reviewed Papers from the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 20-22, 2010, Ostend, Belgium. Durnten-Zurich, Switzerland: TTP, 2012.

Cita MLA (8a ed.)

International Symposium on Ultra Clean Processing of Semiconductor Surfaces Ostend, Belgium, et al. Ultra Clean Processing of Semiconductor Surfaces X: Selected, Peer Reviewed Papers from the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 20-22, 2010, Ostend, Belgium. TTP, 2012.

Precaución: Estas citas no son 100% exactas.