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Soft x-rays and extreme ultraviolet radiation : principles and applications /
"This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy."--BO...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Cambridge ; New York :
Cambridge University Press,
2000.
|
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
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| 020 | |z 9780521652148 | ||
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| 035 | |a (OCoLC)818666348 |z (OCoLC)855534552 |z (OCoLC)985336555 |z (OCoLC)1136696292 | ||
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| 100 | 1 | |a Attwood, David T. | |
| 245 | 1 | 0 | |a Soft x-rays and extreme ultraviolet radiation : |b principles and applications / |c David Attwood. |
| 260 | |a Cambridge ; |a New York : |b Cambridge University Press, |c 2000. | ||
| 300 | |a 1 online resource (xvi, 470 pages) : |b illustrations (some color) | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 504 | |a Includes bibliographical references and index. | ||
| 505 | 0 | 0 | |g Ch. 1. |t Introduction -- |g Ch. 2. |t Radiation and scattering at EUV and soft x-ray wavelengths -- |g Ch. 3. |t Wave propagation and refractive index at EUV and soft x-ray wavelengths -- |g Ch. 4. |t Multilayer interference coatings -- |g Ch. 5. |t Synchrotron radiation -- |g Ch. 6. |t Physics of hot dense plasmas -- |g Ch. 7. |t Extreme ultraviolet and soft x-ray lasers -- |g Ch. 8. |t Coherence at short wavelengths -- |g Ch. 9. |t Soft x-ray microscopy with diffractive optics -- |g Ch. 10. |t Extreme ultraviolet and x-ray lithography. |
| 520 | 1 | |a "This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy."--BOOK JACKET. "The book will be of interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science."--Jacket | |
| 588 | 0 | |a Print version record. | |
| 590 | |a eBooks on EBSCOhost |b EBSCO eBook Subscription Academic Collection - Worldwide | ||
| 650 | 0 | |a Grenz rays. | |
| 650 | 0 | |a Ultraviolet radiation. | |
| 650 | 2 | |a Ultraviolet Rays | |
| 650 | 6 | |a Rayons limite. | |
| 650 | 6 | |a Rayonnement ultraviolet. | |
| 650 | 7 | |a ultraviolet radiation. |2 aat | |
| 650 | 7 | |a SCIENCE |x Physics |x Nuclear. |2 bisacsh | |
| 650 | 7 | |a Grenz rays |2 fast | |
| 650 | 7 | |a Ultraviolet radiation |2 fast | |
| 650 | 7 | |a Extremes Ultraviolett |2 gnd | |
| 650 | 7 | |a Weiche Röntgenstrahlung |2 gnd | |
| 650 | 7 | |a Rayonnement ultraviolet. |2 ram | |
| 650 | 7 | |a Rayons X. |2 ram | |
| 776 | 0 | 8 | |i Print version: |a Attwood, David T. |t Soft x-rays and extreme ultraviolet radiation. |d Cambridge ; New York : Cambridge University Press, 2000 |z 0521652146 |w (DLC) 99021078 |w (OCoLC)40964814 |
| 856 | 4 | 0 | |u https://ebsco.uam.elogim.com/login.aspx?direct=true&scope=site&db=nlebk&AN=510939 |z Texto completo |
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