Plasma processing and processing science /

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Bibliographic Details
Call Number:Libro Electrónico
Corporate Authors: National Research Council (U.S.). Panel on Plasma Processing, National Research Council (U.S.). Naval Studies Board, National Research Council (U.S.). Commission on Physical Sciences, Mathematics, and Applications
Other Authors: Chen, Francis F., 1929-
Format: Electronic eBook
Language:Inglés
Published: Washington, D.C. : National Academy Press, 1995.
Series:NRL strategic series.
Subjects:
Plasma engineering.
Semiconductors > Etching.
Plasma etching.
Technique des plasmas.
Semi-conducteurs > Attaque chimique.
Gravure par plasma.
TECHNOLOGY & ENGINEERING > Mechanical.
Plasma engineering
Plasma etching
Semiconductors > Etching
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