Directed self-assembly of block copolymers for nano-manufacturing /

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The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufactur...

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Bibliographic Details
Call Number:Libro Electrónico
Other Authors: Gronheid, Roel (Editor), Nealey, Paul (Editor)
Format: Electronic eBook
Language:Inglés
Published: Cambridge : Woodhead Publishing, [2015]
Series:Woodhead Publishing series in electronic and optical materials ; no. 83.
Subjects:
Block copolymers.
Self-assembly (Chemistry)
Nanomanufacturing.
Copolymères séquencés.
Autoassemblage.
Nanofabrication.
SCIENCE > Chemistry > Organic.
Block copolymers
Nanomanufacturing
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