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Ultraviolet Laser Technology and Applications.
Ultraviolet Laser Technology and Applications is a hands-on reference text that identifies the main areas of UV laser technology; describes how each is applied; offers clearly illustrated examples of UV opticalsystems applications; and includes technical data on optics, lasers, materials, and system...
| Clasificación: | Libro Electrónico |
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| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Burlington :
Elsevier Science,
1995.
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| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- Cover image; Title page; Table of Contents; Copyright; Preface; Acknowledgments; Chapter 1: Ultraviolet Light; Publisher Summary; 1.1 Introduction; 1.2 The Ultraviolet Spectrum; 1.3 Historical Development of the Laser; 1.4 How a Laser Works; 1.5 UV Sources; 1.6 UV Lasers; 1.7 Inert Gas UV Lasers; 1.8 Metal Vapor Lasers; 1.9 Nitrogen Lasers; 1.10 Helium-Neon Lasers; 1.11 The Alexandrite Laser; Glossary of Terms; Chapter 2: Ablation; Publisher Summary; 2.1 The Ablation Phenomenon; 2.2 Background and History of Ablation; 2.3 Early Discoveries and Uses of Ablation; 2.4 Ablation Mechanisms.
- 2.5 Practical Characteristics of UV ReactionsGlossary of Terms; Chapter 3: The Excimer Laser; Publisher Summary; 3.1 Introduction; 3.2 History; 3.3 Theory of Operation; 3.4 The Gain Profile; 3.5 Excimer Laser Subsystems; 3.6 Laser Operation; 3.7 Laser Installation; 3.8 Laser Maintenance; 3.9 Gas Safety Guidelines; 3.10 UV Safety; Glossary of Terms; Chapter 4: UV Materials Research; Publisher Summary; 4.1 Introduction; 4.2 Laser Mass Spectral Analysis; 4.3 157-nm Fluorine Laser Processing; 4.4 Production of X-Rays with 248 nm Energy; 4.5 Excimer Laser-Induced Fluorescence; 4.6 Tunable UV Laser.
- 4.7 Laser Chemical Vapor Deposition4.8 Surface Analysis by Laser Ionization; 4.9 Photopolymer Research; 4.10 Laser Treatment of Organosilicons; 4.11 UV Laser Cleaning; 4.12 Cross-Sectioning Delicate Structures; Glossary of Terms; Chapter 5: UV Optics and Coatings; Publisher Summary; 5.1 Introduction; 5.2 UV Optical Requirements; 5.3 UV Optical Materials; 5.4 Radiation Damage; 5.5 Coating Manufacture; 5.6 UV Coatings and Reflection; 5.7 Extreme UV Coatings; 5.8 Single Layer Antireflection Coatings; 5.9 Multilayer Antireflection Coatings; 5.10 Dielectric Reflector Coatings.
- 5.11 Metal Reflector Coatings5.12 UV Coating Types by Application; 5.13 Coating Damage and Defects; 5.14 Coating versus Polarization; 5.15 Optical Fiber Beam Delivery; Glossary of Terms; Chapter 6: UV Laser Cleaning; Publisher Summary; 6.1 Introduction; 6.2 Technology Factors in Surface Contamination; 6.3 Size of Contaminants; 6.4 Contamination; 6.5 Integrated Circuit Cleaning; 6.6 Thin Film Heads; 6.7 Flat Panel Display Cleanings; 6.8 Compact Discs; 6.9 Printed Circuit Boards; 6.10 Cleaning Semiconductor Surfaces; 6.11 Laser Ablative Cleaning; 6.12 Debris Removal; Glossary of Terms.
- Chapter 7: Annealing and PlanarizingPublisher Summary; 7.1 Introduction; 7.2 Annealing Parameters; 7.3 Laser versus Electron Beam; 7.4 Pulsed versus Continuous Lasers; 7.5 Annealing Process Control; 7.6 Laser Planarization; 7.7 IC Topography Problems; 7.8 Resist Imaging on Topography; 7.9 Planarization with Polymer Coatings; 7.10 Nonlaser Thermal Planarization; 7.11 UV Laser Planarization; Glossary of Terms; Chapter 8: Deep-UV Microlithography; Publisher Summary; 8.1 Introduction; 8.2 Evolution of Deep-UV Lithography; 8.3 Deep-UV Technology: Resolution; 8.4 Resolution: The "k" parameter.