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Atomic layer deposition : principles, characteristics, and nanotechnology applications /
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It cov...
| Cote: | Libro Electrónico |
|---|---|
| Auteur principal: | |
| Autres auteurs: | , , |
| Format: | Électronique eBook |
| Langue: | Inglés |
| Publié: |
Hoboken, New Jersey :
John Wiley & Sons,
[2013]
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| Sujets: | |
| Accès en ligne: | Texto completo |