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Microreactors in Organic Chemistry and Catalysis.

For this second edition all the chapters have been revised and updated to reflect the latest developments, plus a new chapter on ""Analysis and optimization of reactions"" is now included. It remains a comprehensive publication covering most aspects of the topic. The use of micro...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Wirth, Thomas
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Weinheim : Wiley, 2013.
Edición:2nd ed.
Temas:
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Microreactors in Organic Chemistry and Catalysis; Contents; Preface to the First Edition; Preface to the Second Edition; List of Contributors; 1 Properties and Use of Microreactors; 1.1 Introduction; 1.1.1 A Brief History of Microreactors; 1.1.2 Advantages of Microreactors; 1.2 Physical Characteristics of Microreactors; 1.2.1 Geometries; 1.2.2 Constructional Materials and Their Properties; 1.3 Fluid Flow and Delivery Regimes; 1.3.1 Fluid Flow; 1.3.2 Fluid Delivery; 1.3.3 Mixing Mechanisms; 1.4 Multifunctional Integration; 1.5 Uses of Microreactors; 1.5.1 Overview.
  • 1.5.1.1 Fast and Exothermic Reactions1.5.2 Precision Particle Manufacture; 1.5.3 Wider Industrial Context; 1.5.3.1 Sustainability Agenda; 1.5.3.2 Point-of-Demand Synthesis; References; 2 Fabrication of Microreactors Made from Metals and Ceramic; 2.1 Manufacturing Techniques for Metals; 2.2 Etching; 2.3 Machining; 2.4 Generative Method: Selective Laser Melting; 2.5 Metal Forming Techniques; 2.6 Assembling and Bonding of Metal Microstructures; 2.7 Ceramic Devices; 2.8 Joining and Sealing; References; 3 Microreactors Made of Glass and Silicon; 3.1 How Microreactors Are Constructed.
  • 3.1.1 Glass As Material3.1.2 Silicon As Material; 3.2 The Structuring of Glass and Silicon; 3.2.1 Structuring by Means of Masked Etching As in Microsystems Technology; 3.2.2 Etching Technologies; 3.2.2.1 Anisotropic (Crystallographic) Wet Chemical Etching of Silicon (KOH); 3.3 Isotropic Wet Chemical Etching of Silicon; 3.3.1 3.3.1.1 Isotropic Wet Chemical Etching of Silicon; 3.3.1.2 Isotropic Wet Chemical Etching of Silicon Glass; 3.3.2 Other Processes; 3.3.2.1 Photostructuring of Special Glass; 3.3.3 Drilling, Diamond Lapping, Ultrasonic Lapping; 3.3.4 Micro Powder Blasting; 3.3.5 Summary.
  • 3.4 Other Processes3.4.1 Sensor Integration; 3.5 Thin Films; 3.6 Bonding Methods; 3.6.1 Anodic Bonding of Glass and Silicon; 3.6.2 Glass Fusion Bonding; 3.6.3 Silicon Direct Bonding (Silicon Fusion Bonding); 3.6.4 Establishing Fluid Contact; 3.7 Other Materials; References; 4 Automation in Microreactor Systems; 4.1 Introduction; 4.2 Automation System; 4.3 Automated Optimization with HPLC Sampling; 4.4 Automated Multi-Trajectory Optimization; 4.5 Kinetic Model Discrimination and Parameter Fitting; 4.6 Conclusions and Outlook; References; 5 Homogeneous Reactions; 5.1 Acid-Promoted Reactions.
  • 5.2 Base-Promoted Reactions5.3 Radical Reactions; 5.4 Condensation Reactions; 5.5 Metal-Catalyzed Reactions; 5.6 High Temperature Reactions; 5.7 Oxidation Reactions; 5.8 Reaction with Organometallic Reagents; References; 6 Homogeneous Reactions II: Photochemistry and Electrochemistry and Radiopharmaceutical Synthesis; 6.1 Photochemistry in Flow Reactors; 6.2 Electrochemistry in Microreactors; 6.3 Radiopharmaceutical Synthesis in Microreactors; 6.3.1 Fluorinations in Microreactors; 6.3.2 Synthesis of 11C-Labeled PET Radiopharmaceuticals in Microreactors; 6.4 Conclusion and Outlook; References.