Atomic Layer Deposition for Semiconductors
Atomic Layer Deposition (ALD) was originally designed for depositing uniform passivation layers over a very large area for display devices in the late 1970s. Only recently, in the 21st century, has the this technique become popular for high integrated semiconductor memory devices. This book discuss...
Cote: | Libro Electrónico |
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Collectivité auteur: | SpringerLink (Online service) |
Autres auteurs: | Hwang, Cheol Seong (Éditeur intellectuel) |
Format: | Électronique eBook |
Langue: | Inglés |
Publié: |
New York, NY :
Springer US : Imprint: Springer,
2014.
|
Édition: | 1st ed. 2014. |
Sujets: | |
Accès en ligne: | Texto Completo |
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